Rocking disc electro-deposition of copper films on Mo/MoSe2 substrates

Formation of Cupric Oxide Films on Quartz Substrates by Annealing the Copper Films

In the present work, cupric oxide (CuO) films were obtained through thermal annealing of the copper (Cu) films deposited on quartz substrates by DC magnetron sputtering method. The annealing was performed in air atmosphere for different times ranging from 60-240 min at temperature of 400 ºC. The influence of annealing times on structural and morphological properties of the films was investi...

Aerosol Deposition on Transparent Electro-Optic Films for Optical Modulators

Complex thin oxide films with electro-optic (EO) properties are promising for use in advanced optical devices because of their large EO effect. We developed a method of aerosol deposition (AD) for fabricating EO films. The mechanism for AD is based on the solidification by impact of submicron particles onto a substrate. Since particles in AD films preserve their crystalline structure during the...

formation of cupric oxide films on quartz substrates by annealing the copper films

Nano-indentation of Copper Thin Films on Silicon Substrates

Indentation methods are finding increasing use in the study of mechanical properties of bulk and thin-film materials over a wide range of size scales (e.g., [1,2]). With the increasing sophistication of instrumented, depth-sensing indentation equipment and of computational methods to model the deformation of materials subjected to indentation, there is growing interest in studying the elastopla...

Two-Stage Chemical Deposition of Oxide Films

Two-stage chemical deposition (TSCD) technique is used to produce ZnO, Mn2O3 and NiO films on soda-lime glass (SL-G) from an aqueous solution of zinc, manganese and nickel complex, respectively. The TSCD method enables the deposition of metal oxide thin films with a thickness which can be controlled during the preparation procedure. The ZnO, Mn2O3 and NiO thin films were polycrystalline films w...